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Radical Monitor
Radical Monitor
ƒÊ-AP Type Nonequilibrium Atmospheric-Pressure Plasma Apparatus
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Radical Monitor

Radical Monitor is the only radical measuring apparatus that can be used during a plasma procesing.

   
Radical Monitor

HDRS can generate very high density radicals during wide range pressure. Various radicals are important for semiconductor applications and advanced nanomaterial processing.

 
μ-AP Type Nonequilibrium Atmospheric-Pressure Plasma Apparatus
It is a small-sized nonequilibrium atmospheric-pressure plasma apparatus that can generate a plasma, which is called "a fourth state of matter", under atmosphere pressure.
 
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